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Generation of short-pulse VUV and XUV radiation

机译:产生短脉冲VUV和XUV辐射

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摘要

Starting from intense short-pulse KrF (248 nm, 25 mJ, 400 fs), ArF (193 nm, 10 mJ, sim1 ps), and Ti:sapphire (810 nm, 100 mJ, 150 fs) laser systems, schemes for the generation of fixed-frequency and tunable VUV and XUV radiation by nonlinear optical techniques are investigated. With the KrF system, a four-wave mixing process in xenon yields tunable radiation in the range of 130–200 nm with output energies of, so far, 100 mgrJ in less than 1 ps. For the XUV spectral range below 100 nm, nonperturbative high-order harmonic generation and frequency mixing processes in noble gas jets are considered. To achieve tunability, the intense fixed-frequency pump laser radiation is mixed with less intense but broadly tunable radiation from short-pulse dye lasers or optical parametric generator-amplifier systems. In this way, tunability down to wavelengths of less than 40 nm has been demonstrated.
机译:从强烈的短脉冲KrF(248 nm,25 mJ,400 fs),ArF(193 nm,10 mJ,sim1 ps)和Ti:蓝宝石(810 nm,100 mJ,150 fs)激光系统开始,研究了通过非线性光学技术产生固定频率和可调谐VUV和XUV辐射的方法。借助KrF系统,氙气中的四波混合过程会产生130-200 nm范围内的可调辐射,到目前为止,其输出能量在不到1 ps的时间内即可达到100 mgrJ。对于低于100 nm的XUV光谱范围,考虑了惰性气体射流中的非扰动高阶谐波生成和混频过程。为了实现可调谐性,将强固定频率泵浦激光辐射与来自短脉冲染料激光器或光学参量发生器-放大器系统的强度较低但可广泛调谐的辐射混合。以这种方式,已经证明了低至小于40 nm波长的可调性。

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